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Electron Beam Welding

Electron Beam Welding
A Book

by H Schultz

  • Publisher : Woodhead Publishing
  • Release : 1993
  • Pages : 240
  • ISBN : 9781855730502
  • Language : En, Es, Fr & De
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Translated from the German, this is a practical book for engineers which explains the trials, development and manufacturing processes involved in electron beam welding.

Ultraviolet and electron beam (UV/EB) cured coatings, inks and adhesives

Ultraviolet and electron beam (UV/EB) cured coatings, inks and adhesives
A Book

by Anonim

  • Publisher : DIANE Publishing
  • Release : 2022
  • Pages : 129
  • ISBN : 1428901280
  • Language : En, Es, Fr & De
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A System for Electron-beam Melting

A System for Electron-beam Melting
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 1964
  • Pages : 35
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Mechanical Properties of Arc-melted and Electron-beam-melted Tungsten-base Alloys

Mechanical Properties of Arc-melted and Electron-beam-melted Tungsten-base Alloys
A Book

by Peter L. Raffo

  • Publisher : Unknown Publisher
  • Release : 1965
  • Pages : 20
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Laser and Electron Beam Processing of Materials

Laser and Electron Beam Processing of Materials
A Book

by C.W. White

  • Publisher : Elsevier
  • Release : 2012-12-02
  • Pages : 788
  • ISBN : 0323142532
  • Language : En, Es, Fr & De
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Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.

Electron Beam Analysis of Materials

Electron Beam Analysis of Materials
A Book

by M. H. Loretto

  • Publisher : Springer Science & Business Media
  • Release : 2012-12-06
  • Pages : 210
  • ISBN : 9400955405
  • Language : En, Es, Fr & De
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The examination of materials using electron beam techniques has developed continuously for over twenty years and there are now many different methods of extracting detailed structural and chemical information using electron beams. These techniques which include electron probe microanalysis, trans mission electron microscopy, Auger spectroscopy and scanning electron microscopy have, until recently, developed more or less independently of each other. Thus dedicated instruments designed to optimize the performance for a specific application have been available and correspondingly most of the available textbooks tend to have covered the theory and practice of an individual technique. There appears to be no doubt that dedicated instru ments taken together with the specialized textbooks will continue to be the appropriate approach for some problems. Nevertheless the underlying electron-specimen interactions are common to many techniques and in view of the fact that a range of hybrid instruments is now available it seems appropriate to provide a broad-based text for users of these electron beam facilities. The aim of the present book is therefore to provide, in a reasonably concise form, the material which will allow the practitioner of one or more of the individual techniques to appreciate and to make use of the type of information which can be obtained using other electron beam techniques.

The Relativistic Electron Beam Plasma Heating Experiment

The Relativistic Electron Beam Plasma Heating Experiment
A Book

by Michael D. Montgomery,Jerald V. Parker

  • Publisher : Unknown Publisher
  • Release : 1980
  • Pages : 8
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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An intense (5 x 105 Amp/cm2), relativistic (5 MeV), electron beam will be used to investigate the heating of small volumes (~5 to 10 cm3) of dense plasma (1017-- 1018 electrons/cm3) to kilovolt temperatures via the electrostatic two-stream instability.

Electron-Beam Interactions with Solids

Electron-Beam Interactions with Solids
Application of the Monte Carlo Method to Electron Scattering Problems

by Maurizio Dapor

  • Publisher : Springer
  • Release : 2003-07-03
  • Pages : 110
  • ISBN : 3540365079
  • Language : En, Es, Fr & De
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The interaction of an electron beam with a solid target has been studied since the early part of the past century. Since 1960, the electron–solid interaction hasbecomethesubjectofanumberofinvestigators’workowingtoitsfun- mental role in scanning electron microscopy, in electron-probe microanalysis, in Auger electron spectroscopy, in electron-beam lithography and in radiation damage. The interaction of an electron beam with a solid target has often been investigated theoretically by using the Monte Carlo method, a nume- cal procedure involving random numbers that is able to solve mathematical problems. This method is very useful for the study of electron penetration in matter. The probabilistic laws of the interaction of an individual electron with the atoms constituting the target are well known. Consequently, it is possible to compute the macroscopic characteristics of interaction processes by simulating a large number of real trajectories, and then averaging them. The aim of this book is to study the probabilistic laws of the interaction of individual electrons with atoms (elastic and inelastic cross-sections); to - vestigate selected aspects of electron interaction with matter (backscattering coe?cients for bulk targets, absorption, backscattering and transmission for both supported and unsupported thin ?lms, implantation pro?les, seconda- electron emission, and so on); and to introduce the Monte Carlo method and its applications to compute the macroscopic characteristics of the inter- tion processes mentioned above. The book compares theory, computational simulations and experimental data in order to o?er a more global vision.

Electron-beam Crystallization of Silicon, Germanium, and Cadmium Sulfide

Electron-beam Crystallization of Silicon, Germanium, and Cadmium Sulfide
A Book

by John C. Evans (Jr.)

  • Publisher : Unknown Publisher
  • Release : 1968
  • Pages : 22
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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X-Ray Spectrometry in Electron Beam Instruments

X-Ray Spectrometry in Electron Beam Instruments
A Book

by Joseph Goldstein,Dale E. Newbury,David B. Williams

  • Publisher : Springer Science & Business Media
  • Release : 2012-12-06
  • Pages : 372
  • ISBN : 1461518253
  • Language : En, Es, Fr & De
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From its early days in the 1950s, the electron microanalyzer has offered two principal ways of obtaining x-ray spectra: wavelength dispersive spectrometry (WDS), which utilizes crystal diffraction, and energy dispersive spectrometry (EDS), in which the x-ray quantum energy is measured directly. In general, WDS offers much better peak separation for complex line spectra, whereas EDS gives a higher collection efficiency and is easier and cheaper to use. Both techniques have undergone major transformations since those early days, from the simple focusing spectrometerand gas proportional counter of the 1950s to the advanced semiconductor detectors and programmable spectrometersoftoday. Becauseofthesedevelopments, thecapabilities and relative merits of EDS and WDS techniques have been a recurring feature of microprobeconferences for nearly40 years, and this volume bringstogetherthepapers presented at the Chuck Fiori Memorial Symposium, held at the Microbeam Analysis Society Meeting of 1993. Several themes are apparent in this rich and authoritative collection of papers, which have both a historical and an up-to-the-minute dimension. Light element analysis has long been a goal of microprobe analysts since Ray Dolby first detected K radiation with a gas proportional counter in 1960. WDS techniques (using carbon lead stearate films) were not used for this purpose until four years later. Now synthetic multilayers provide the best dispersive elements for quantitative light element analy sis-still used in conjunction with a gas counter.

Electron Beam Pasteurization and Complementary Food Processing Technologies

Electron Beam Pasteurization and Complementary Food Processing Technologies
A Book

by Suresh Pillai,Shima Shayanfar

  • Publisher : Elsevier
  • Release : 2014-11-28
  • Pages : 352
  • ISBN : 1782421084
  • Language : En, Es, Fr & De
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Food safety is a constant challenge for the food industry, and food irradiation technology has developed significantly since its introduction, moving from isotope irradiation to the use of electron beam technology. Electron Beam Pasteurization and Complementary Food Processing Technologies explores the application of electron beam pasteurization in conjunction with other food processing technologies to improve the safety and quality of food. Part one provides an overview of the issues surrounding electron beam pasteurization in food processing. Part two looks at different thermal and non-thermal food processing technologies that complement irradiation. Finally, a case study section on the commercial applications of e-beam processing provides examples from industry.

Rotational-temperature Determination in Flowing Nitrogen Using an Electron Beam

Rotational-temperature Determination in Flowing Nitrogen Using an Electron Beam
A Book

by D. C. Lillicrap,L. P. Lee

  • Publisher : Unknown Publisher
  • Release : 1971
  • Pages : 31
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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The measurement of rotational temperature by the electron-beam fluorescence technique is investigated for temperatures between 78 K and 300 K by using the 0-0 band of the nitrogen first negative system. Existing methods for calculating the rotational temperature from electron-beam spectra result in values which are higher than the true temperature and the error increases with density and electron-beam current. The errors are believed to arise through neglect of the effects of secondary electrons. Excitation by low-energy secondary electrons can increase the population of the sparsely populated rotational ground states at the expense of the abundantly populated states. This secondary excitation is proposed as the cause of the error in the calculated rotational temperature and a theoretical study determines that the density and beam current govern the excitation rate. Rotational-temperature measurements are made in a flowing stream of nitrogen at a known temperature for a range of densities and beam currents.

Electron Beam-Specimen Interactions and Simulation Methods in Microscopy

Electron Beam-Specimen Interactions and Simulation Methods in Microscopy
A Book

by Budhika G. Mendis

  • Publisher : John Wiley & Sons
  • Release : 2018-03-16
  • Pages : 296
  • ISBN : 1118696557
  • Language : En, Es, Fr & De
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A detailed presentation of the physics of electron beam-specimen interactions Electron microscopy is one of the most widely used characterisation techniques in materials science, physics, chemistry, and the life sciences. This book examines the interactions between the electron beam and the specimen, the fundamental starting point for all electron microscopy. Detailed explanations are provided to help reinforce understanding, and new topics at the forefront of current research are presented. It provides readers with a deeper knowledge of the subject, particularly if they intend to simulate electron beam-specimen interactions as part of their research projects. The book covers the vast majority of commonly used electron microscopy techniques. Some of the more advanced topics (annular bright field and dopant atom imaging, atomic resolution chemical analysis, band gap measurements) provide additional value, especially for readers who have access to advanced instrumentation, such as aberration-corrected and monochromated microscopes. Electron Beam-Specimen Interactions and Simulation Methods in Microscopy offers enlightening coverage of: the Monte-Carlo Method; Multislice Simulations; Bloch Waves in Conventional and Analytical Transmission Electron Microscopy; Bloch Waves in Scanning Transmission Electron Microscopy; Low Energy Loss and Core Loss EELS. It also supplements each chapter with clear diagrams and provides appendices at the end of the book to assist with the pre-requisites. A detailed presentation of the physics of electron beam-specimen interactions Each chapter first discusses the background physics before moving onto simulation methods Uses computer programs to simulate electron beam-specimen interactions (presented in the form of case studies) Includes hot topics brought to light due to advances in instrumentation (particularly aberration-corrected and monochromated microscopes) Electron Beam-Specimen Interactions and Simulation Methods in Microscopy benefits students undertaking higher education degrees, practicing electron microscopists who wish to learn more about their subject, and researchers who wish to obtain a deeper understanding of the subject matter for their own work.

Spectroscopic Analysis of Electron-beam-induced Fluorescence in Hypersonic Helium Flow

Spectroscopic Analysis of Electron-beam-induced Fluorescence in Hypersonic Helium Flow
A Book

by Mervin E. Hillard (Jr.)

  • Publisher : Unknown Publisher
  • Release : 1970
  • Pages : 21
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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The ability to visualize low-density hypersonic helium flow has been substantially improved through the use of a high-energy (26-keV) electron beam in the Langley 22-inch helium tunnel at a Mach number of about 20. It has been found that the electron beam efficiently excites the test gas to produce visible fluorescence throughout the flow field with a brightness which is dependent upon the local gas density. The present investigation involved the spectroscopic analysis of the electron-beaminduced fluorescence. It was conducted in order to better understand the excitation and emission mechanisms involved and to use this knowledge to improve the visualization technique further. Spectrograms of the fluorescence, both in the free-stream and modelflow fields, have been made; and the major radiating species have been identified as atomic helium, molecular helium, and the molecular nitrogen ion. The molecular nitrogen ion was found to be the emitter whose fluorescence enhanced the shock structure. Based on the results of this work, areas for further work have been identified.

Electron-beam Purification of Vanadium

Electron-beam Purification of Vanadium
A Book

by W. E. Anable

  • Publisher : Unknown Publisher
  • Release : 1967
  • Pages : 24
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Proceedings of the Symposium on Electron Beam Therapy

Proceedings of the Symposium on Electron Beam Therapy
Conducted September 25-27, 1979

by Florence C. H. Chu,John Seth Laughlin

  • Publisher : Unknown Publisher
  • Release : 1981
  • Pages : 164
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Electron Beam Microanalysis

Electron Beam Microanalysis
A Book

by Anonim

  • Publisher : ASTM International
  • Release : 2022
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Electron Beam and Laser Beam Technology

Electron Beam and Laser Beam Technology
A Book

by Ladislaus Marton,A. B. El-Kareh

  • Publisher : Unknown Publisher
  • Release : 1968
  • Pages : 300
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Nanofabrication Using Focused Ion and Electron Beams

Nanofabrication Using Focused Ion and Electron Beams
Principles and Applications

by Ivo Utke,Stanislav Moshkalev,Phillip Russell

  • Publisher : Oxford University Press
  • Release : 2012-05-01
  • Pages : 840
  • ISBN : 0190453621
  • Language : En, Es, Fr & De
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Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.

Influence of Electron Beam Behavior on Klystron Efficiency

Influence of Electron Beam Behavior on Klystron Efficiency
A Book

by Stanford University. Microwave Laboratory,Jose Thomaz Senise

  • Publisher : Unknown Publisher
  • Release : 1958
  • Pages : 96
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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