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High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering
Fundamentals, Technologies, Challenges and Applications

by Daniel Lundin,Jon Tomas Gudmundsson,Tiberiu Minea

  • Publisher : Unknown Publisher
  • Release : 2019-09-13
  • Pages : 398
  • ISBN : 0128124547
  • Language : En, Es, Fr & De
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High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

Discharge Physics of High Power Impulse Magnetron Sputtering

Discharge Physics of High Power Impulse Magnetron Sputtering
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 2010
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of?gasless? self-sputtering.

Erratum

Erratum
High Power Impulse Magnetron Sputtering

by Anonim

  • Publisher : Unknown Publisher
  • Release : 2007
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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High Power Impulse Magnetron Sputtering (HIPIMS) - FundamentalPlasma Studies and Materials Synthesis

High Power Impulse Magnetron Sputtering (HIPIMS) - FundamentalPlasma Studies and Materials Synthesis
A Book

by Ante Hecimovic

  • Publisher : Unknown Publisher
  • Release : 2009
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Plasma Diagnosis of Reactive High Power Impulse Magnetron Sputtering (HiPIMS) Discharges

Plasma Diagnosis of Reactive High Power Impulse Magnetron Sputtering (HiPIMS) Discharges
A Book

by Michael Bowes

  • Publisher : Unknown Publisher
  • Release : 2014
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Plasma Flares in High Power Impulse Magnetron Sputtering

Plasma Flares in High Power Impulse Magnetron Sputtering
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 2012
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Plasma Properties in High Power Impulse Magnetron Sputtering

Plasma Properties in High Power Impulse Magnetron Sputtering
A Book

by Daniel Lundin

  • Publisher : Unknown Publisher
  • Release : 2008
  • Pages : 46
  • ISBN : 9789173939324
  • Language : En, Es, Fr & De
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Fundamentals of High Power Impulse Magnetron Sputtering

Fundamentals of High Power Impulse Magnetron Sputtering
A Book

by Johan Böhlmark,Linköpings universitet. Institutionen för fysik, kemi och biologi

  • Publisher : Unknown Publisher
  • Release : 2006
  • Pages : 64
  • ISBN : 9789185523962
  • Language : En, Es, Fr & De
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על המקרא ועל היהדות

על המקרא ועל היהדות
קובץ כתבים

by Anonim

  • Publisher : Unknown Publisher
  • Release : 1985
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Multifunctional transition metal diboride thin films grown by magnetron sputtering with metal-ion irradiation

Multifunctional transition metal diboride thin films grown by magnetron sputtering with metal-ion irradiation
A Book

by Babak Bakhit

  • Publisher : Linköping University Electronic Press
  • Release : 2020-04-01
  • Pages : 27
  • ISBN : 917929877X
  • Language : En, Es, Fr & De
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Self-organization and Self-limitation in High Power Impulse Magnetron Sputtering

Self-organization and Self-limitation in High Power Impulse Magnetron Sputtering
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 2012
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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6th International Conference on High Power Impulse Magnetron Sputtering (HIPIMS 2015)

6th International Conference on High Power Impulse Magnetron Sputtering (HIPIMS 2015)
A Book

by Ralf Bandorf

  • Publisher : Unknown Publisher
  • Release : 2016
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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High Power Impulse Magnetron Sputtering Under Industrial Conditions

High Power Impulse Magnetron Sputtering Under Industrial Conditions
A Book

by Mattias Samuelsson,Linköpings universitet. Institutionen för fysik, kemi och biologi

  • Publisher : Unknown Publisher
  • Release : 2011
  • Pages : 45
  • ISBN : 9789173931946
  • Language : En, Es, Fr & De
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Time Resolved Diagnostic Study of High Power Impulse Magnetron Sputtering (HiPIMS) Discharges

Time Resolved Diagnostic Study of High Power Impulse Magnetron Sputtering (HiPIMS) Discharges
A Book

by Anurag Kumar Mishra

  • Publisher : Unknown Publisher
  • Release : 2011
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Benefits of the Controlled Reactive High-power Impulse Magnetron Sputtering of Stoichiometric ZrO2 Films

Benefits of the Controlled Reactive High-power Impulse Magnetron Sputtering of Stoichiometric ZrO2 Films
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 2015
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Modeling High Power Impulse Magnetron Sputtering Discharges

Modeling High Power Impulse Magnetron Sputtering Discharges
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 2012
  • Pages : 52
  • ISBN : 9789175013381
  • Language : En, Es, Fr & De
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Invasive and Non-invasive Diagnostics of High Power Impulse Magnetron Sputtering (HiPIMS) Discharges

Invasive and Non-invasive Diagnostics of High Power Impulse Magnetron Sputtering (HiPIMS) Discharges
A Book

by Bernd Liebig

  • Publisher : Unknown Publisher
  • Release : 2013
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Analytic and Numerical Investigation of High Power Impulse Magnetron Sputtering Discharges

Analytic and Numerical Investigation of High Power Impulse Magnetron Sputtering Discharges
A Book

by Sara Gallian

  • Publisher : Unknown Publisher
  • Release : 2015
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Deposition Rates of High Power Impulse Magnetron Sputtering

Deposition Rates of High Power Impulse Magnetron Sputtering
Physics and Economics

by Anonim

  • Publisher : Unknown Publisher
  • Release : 2009
  • Pages : 18
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes to due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes of the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction of the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits considered.

Magnetic Field Optimization for High Power Impulse Magnetron Sputtering

Magnetic Field Optimization for High Power Impulse Magnetron Sputtering
A Book

by Priya Raman

  • Publisher : Unknown Publisher
  • Release : 2016
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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