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In Situ Characterization of Thin Film Growth

In Situ Characterization of Thin Film Growth
A Book

by Gertjan Koster,Guus Rijnders

  • Publisher : Elsevier
  • Release : 2011-10-05
  • Pages : 296
  • ISBN : 0857094955
  • Language : En, Es, Fr & De
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Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques

In Situ Real-Time Characterization of Thin Films

In Situ Real-Time Characterization of Thin Films
A Book

by Orlando Auciello,Alan R. Krauss

  • Publisher : John Wiley & Sons
  • Release : 2001
  • Pages : 263
  • ISBN : 9780471241416
  • Language : En, Es, Fr & De
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An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application

In Situ Characterization of Oxide Thin Film Growth

In Situ Characterization of Oxide Thin Film Growth
A Book

by Eric James Watko

  • Publisher : Unknown Publisher
  • Release : 1995
  • Pages : 170
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Why in Situ, Real-time Characterization of Thin Film Growth Processes?

Why in Situ, Real-time Characterization of Thin Film Growth Processes?
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 1995
  • Pages : 129
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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In Situ Characterization Of Single-Wall Carbon Nanotube Thin Film Growth Using The Polarization Properties Of Tilted Fibre Bragg Gratings

In Situ Characterization Of Single-Wall Carbon Nanotube Thin Film Growth Using The Polarization Properties Of Tilted Fibre Bragg Gratings
A Book

by Mohammad Zahirul Alam

  • Publisher : Unknown Publisher
  • Release : 2012
  • Pages : 180
  • ISBN : 9780494934944
  • Language : En, Es, Fr & De
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Ion Beams as a Means of Deposition and In-situ Characterization of Thin Films and Thin Film Layered Structures

Ion Beams as a Means of Deposition and In-situ Characterization of Thin Films and Thin Film Layered Structures
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 1992
  • Pages : 27
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Ion beam-surface interactions produce many effects in thin film deposition which are similar to those encountered in plasma deposition processes. However, because of the lower pressures and higher directionality associated with the ion beam process, it is easier to avoid some sources of film contamination and to provide better control of ion energies and fluxes. Additional effects occur in the ion beam process because of the relatively small degree of thermalization resulting from gas phase collisions with both the ion beam and atoms sputtered from the target. These effects may be either beneficial or detrimental to the film properties, depending on the material and deposition conditions. Ion beam deposition is particularly suited to the deposition of multi-component films and layered structures, and can in principle be extended to a complete device fabrication process. However, complex phenomena occur in the deposition of many materials of high technical interest which make it desirable to monitor the film growth at the monolayer level. It is possible to make use of ion-surface interactions to provide a full suite of surface analytical capabilities in one instrument, and this data may be obtained at ambient pressures which are far too high for conventional surface analysis techniques. Such an instrument is under development and its current performance characteristics and anticipated capabilities are described.

In-situ Characterization Techniques for Nanomaterials

In-situ Characterization Techniques for Nanomaterials
A Book

by Challa S.S.R. Kumar

  • Publisher : Springer
  • Release : 2018-04-17
  • Pages : 452
  • ISBN : 3662563223
  • Language : En, Es, Fr & De
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Seventh volume of a 40 volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about In-situ Characterization Techniques for Nanomaterials. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.

Advanced Characterization Techniques for Thin Film Solar Cells

Advanced Characterization Techniques for Thin Film Solar Cells
A Book

by Daniel Abou-Ras,Thomas Kirchartz,Uwe Rau

  • Publisher : John Wiley & Sons
  • Release : 2016-07-13
  • Pages : 760
  • ISBN : 3527699015
  • Language : En, Es, Fr & De
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The book focuses on advanced characterization methods for thin-film solar cells that have proven their relevance both for academic and corporate photovoltaic research and development. After an introduction to thin-film photovoltaics, highly experienced experts report on device and materials characterization methods such as electroluminescence analysis, capacitance spectroscopy, and various microscopy methods. In the final part of the book simulation techniques are presented which are used for ab-initio calculations of relevant semiconductors and for device simulations in 1D, 2D and 3D. Building on a proven concept, this new edition also covers thermography, transient optoelectronic methods, and absorption and photocurrent spectroscopy.

Atmosphere Influence on in Situ Ion Beam Analysis of Thin Film Growth

Atmosphere Influence on in Situ Ion Beam Analysis of Thin Film Growth
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 1994
  • Pages : 23
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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In situ, nondestructive surface characterization of thin-film growth processes in an environment of chemically active gas at pressures of several mTorr is required both for the understanding of growth processes in multicomponent films and layered heterostructures and for the improvement of process reproducibility and device reliability. The authors have developed a differentially pumped pulsed ion beam surface analysis system that includes ion scattering spectroscopy (ISS) and direct recoil spectroscopy (DRS), coupled to an automated ion beam sputter-deposition system (IBSD), to study film growth processes in an environment of chemically active gas, such as required for the growth of oxide, nitride, or diamond thin films. The influence of gas-phase scattering and gas-surface interactions on the ISS and DRS signal intensity and peak shape have been studied. From the intensity variation as a function of ambient gas pressure, the authors have calculated the mean free path and the scattering cross-section for a given combination of primary ion species and ambient gas. Depending on the system geometry and the combination of primary beam and background, it is shown that surface-specific data can be obtained during thin-film growth at pressures ranging from a few mtorr to approximately 1 Torr. Detailed information such as surface composition, structure, and film growth mechanism may be obtained in real-time, making ion beam analysis an ideal nondestructive, in situ probe of thin-film growth processes.

Ion Beam-based Characterization of Multicomponent Oxide Thin Films and Thin Film Layered Structures

Ion Beam-based Characterization of Multicomponent Oxide Thin Films and Thin Film Layered Structures
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 1992
  • Pages : 30
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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Fabrication of thin film layered structures of multi-component materials such as high temperature superconductors, ferroelectric and electro-optic materials, and alloy semiconductors, and the development of hybrid materials requires understanding of film growth and interface properties. For High Temperature Superconductors, the superconducting coherence length is extremely short (5--15 [Angstrom]), and fabrication of reliable devices will require control of film properties at extremely sharp interfaces; it will be necessary to verify the integrity of thin layers and layered structure devices over thicknesses comparable to the atomic layer spacing. Analytical techniques which probe the first 1--2 atomic layers are therefore necessary for in-situ characterization of relevant thin film growth processes. However, most surface-analytical techniques are sensitive to a region within 10--40 [Angstrom] of the surface and are physically incompatible with thin film deposition and are typically restricted to ultra high vacuum conditions. A review of ion beam-based analytical methods for the characterization of thin film and multi-layered thin film structures incorporating layers of multicomponent oxides is presented. Particular attention will be paid to the use of time-of-flight techniques based on the use of 1- 15 key ion beams which show potential for use as nondestructive, real-time, in-situ surface diagnostics for the growth of multicomponent metal and metal oxide thin films.

Printed Films

Printed Films
Materials Science and Applications in Sensors, Electronics and Photonics

by Maria Prudenziati,Jacob Hormadaly

  • Publisher : Elsevier
  • Release : 2012-08-30
  • Pages : 608
  • ISBN : 0857096214
  • Language : En, Es, Fr & De
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Whilst printed films are currently used in varied devices across a wide range of fields, research into their development and properties is increasingly uncovering even greater potential. Printed films provides comprehensive coverage of the most significant recent developments in printed films and their applications. Materials and properties of printed films are the focus of part one, beginning with a review of the concepts, technologies and materials involved in their production and use. Printed films as electrical components and silicon metallization for solar cells are discussed, as are conduction mechanisms in printed film resistors, and thick films in packaging and microelectronics. Part two goes on to review the varied applications of printed films in devices. Printed resistive sensors are considered, as is the role of printed films in capacitive, piezoelectric and pyroelectric sensors, mechanical micro-systems and gas sensors. The applications of printed films in biosensors, actuators, heater elements, varistors and polymer solar cells are then explored, followed by a review of screen printing for the fabrication of solid oxide fuel cells and laser printed micro- and meso-scale power generating devices. With its distinguished editors and international team of expert contributors, Printed films is a key text for anyone working in such fields as microelectronics, fuel cell and sensor technology in both industry and academia. Provides a comprehensive analysis of the most significant recent developments in printed films and their applications Reviews the concepts, properties, technologies and materials involved in the production and use of printed films Analyses the varied applications of printed films in devices, including printed restrictive sensors for physical quantities and printed thick film mechanical micro-systems (MEMS), among others

Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces

Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 1997
  • Pages : 11
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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The objectives of this program are: (1) To demonstrate Time of Flight Ion Scattering and Recoil (ToF-ISARS) Spectroscopy and Spectroscopic Ellipsometry (SE) for in-situ and real time characterization of HTSC thin films and processes. (2) To study HTSC thin film processes and interface reactions.

Handbook of Modern Coating Technologies

Handbook of Modern Coating Technologies
Advanced Characterization Methods

by Mahmood Aliofkhazraei,Ali Nasar,Mircea Chipara,Nadhira Bensaada Laidani,Jeff Th.M. De Hosson

  • Publisher : Elsevier
  • Release : 2021-03-06
  • Pages : 500
  • ISBN : 044463245X
  • Language : En, Es, Fr & De
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Handbook of Modern Coating Technologies: Advanced Characterization Methods reviews advanced characterization methods of modern coating technologies. The topics in this volume consist of scanning vibrating electrode technique, spectroscopic ellipsometry, advances in X-ray diffraction, neutron reflectivity, micro- and nanoprobes, fluorescence technique, stress measurement methods in thin films, micropotentiometry, and localized corrosion studies.

Waste Electrical and Electronic Equipment (WEEE) Handbook

Waste Electrical and Electronic Equipment (WEEE) Handbook
A Book

by Vannessa Goodship,Ab Stevels

  • Publisher : Elsevier
  • Release : 2012-08-30
  • Pages : 752
  • ISBN : 0857096338
  • Language : En, Es, Fr & De
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Electrical and electronic waste is a growing problem as volumes are increasing fast. Rapid product innovation and replacement, especially in information and communication technologies (ICT), combined with the migration from analog to digital technologies and to flat-screen televisions and monitors has resulted in some electronic products quickly reaching the end of their life. The EU directive on waste electrical and electronic equipment (WEEE) aims to minimise WEEE by putting organizational and financial responsibility on producers and distributors for collection, treatment, recycling and recovery of WEEE. Therefore all stakeholders need to be well-informed about their WEEE responsibilities and options. While focussing on the EU, this book draws lessons for policy and practice from all over the world. Part one introduces the reader to legislation and initiatives to manage WEEE. Part two discusses technologies for the refurbishment, treatment and recycling of waste electronics. Part three focuses on electronic products that present particular challenges for recyclers. Part four explores sustainable design of electronics and supply chains. Part five discusses national and regional WEEE management schemes and part six looks at corporate WEEE management strategies. With an authoritative collection of chapters from an international team of authors, Waste electrical and electronic equipment (WEEE) handbook is designed to be used as a reference by policy-makers, producers and treatment operators in both the developed and developing world. Draws lessons for waste electrical and electronic equipment (WEEE) policy and practice from around the world Discusses legislation and initiatives to manage WEEE, including global e-waste initiatives, EU legislation relating to electronic waste, and eco-efficiency evaluation of WEEE take-back systems Sections cover technologies for refurbishment, treatment and recycling of waste, sustainable design of electronics and supply chains, national and regional waste management schemes, and corporate WEEE management strategies

Metal Oxide-Based Thin Film Structures

Metal Oxide-Based Thin Film Structures
Formation, Characterization and Application of Interface-Based Phenomena

by Nini Pryds,Vincenzo Esposito

  • Publisher : Elsevier
  • Release : 2017-09-07
  • Pages : 560
  • ISBN : 0081017529
  • Language : En, Es, Fr & De
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Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike

In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions

In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 2000
  • Pages : 12
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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We have developed new approaches to synthesize superhard/ultrastrong thin films and coatings by chemical vapor deposition (CVD) of unimolecular precursors, and to monitor and characterize the film-growth process in situ and in real time. To this end, we have designed and constructed an ultrahigh vacuum CVD chamber fitted with energy-dispersive x-ray reflectivity (XRR) and multiple- beam optical stress sensor (MOSS) for in situ monitoring of surface morphology and stress evolution of the films under growth. Both of these techniques were applied to the CVD growth of boron and GaN films. We have synthesized novel precursors of C3N3P, Si4CN4, LiBC4N4, BC3N3, BeC2N2, MgC2N2 for CVD growth of films with properties of superhardness. We have also deposited thin films by CVD with the composition of Zr-B-Si-N via reactions of Zr(BH4)4 with SiH4, and Zr(BH4)4 with N(SiH3)4. The elastic constants cli and c44 of these films measured by Brillouin scattering in collaboration with Prof. Sooryakumar of Ohio State University produced results suggesting that films and coatings based on the Zr-B-Si-N system exhibit promising superhard properties.

Handbook of Thin Films, Five-Volume Set

Handbook of Thin Films, Five-Volume Set
A Book

by Hari Singh Nalwa

  • Publisher : Academic Press
  • Release : 2001-10-29
  • Pages : 3451
  • ISBN : 0125129084
  • Language : En, Es, Fr & De
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This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.

Quantum Optics with Semiconductor Nanostructures

Quantum Optics with Semiconductor Nanostructures
A Book

by Frank Jahnke

  • Publisher : Elsevier
  • Release : 2012-07-16
  • Pages : 602
  • ISBN : 0857096397
  • Language : En, Es, Fr & De
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An understanding of the interaction between light and matter on a quantum level is of fundamental interest and has many applications in optical technologies. The quantum nature of the interaction has recently attracted great attention for applications of semiconductor nanostructures in quantum information processing. Quantum optics with semiconductor nanostructures is a key guide to the theory, experimental realisation, and future potential of semiconductor nanostructures in the exploration of quantum optics. Part one provides a comprehensive overview of single quantum dot systems, beginning with a look at resonance fluorescence emission. Quantum optics with single quantum dots in photonic crystal and micro cavities are explored in detail, before part two goes on to review nanolasers with quantum dot emitters. Light-matter interaction in semiconductor nanostructures, including photon statistics and photoluminescence, is the focus of part three, whilst part four explores all-solid-state quantum optics, crystal nanobeam cavities and quantum-dot microcavity systems. Finally, part five investigates ultrafast phenomena, including femtosecond quantum optics and coherent optoelectronics with quantum dots. With its distinguished editor and international team of expert contributors, Quantum optics with semiconductor nanostructures is an essential guide for all those involved with the research, development, manufacture and use of semiconductors nanodevices, lasers and optical components, as well as scientists, researchers and students. A key guide to the theory, experimental realisation, and future potential of semiconductor nanostructures in the exploration of quantum optics Chapters provide a comprehensive overview of single quantum dot systems, nanolasers with quantum dot emitters, and light-matter interaction in semiconductor nanostructures Explores all-solid-state quantum optics, crystal nanobeam cavities and quantum-dot microcavity systems, and investigates ultrafast phenomena

Iron-based Superconducting Thin Films

Iron-based Superconducting Thin Films
A Book

by Silvia Haindl

  • Publisher : Springer Nature
  • Release : 2021
  • Pages : 390
  • ISBN : 3030751325
  • Language : En, Es, Fr & De
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This book provides a modern introduction to the growth, characterization, and physics of iron-based superconducting thin films. Iron pnictide and iron chalcogenide compounds have become intensively studied key materials in condensed matter physics due to their potential for high temperature superconductivity. With maximum critical temperatures of around 60 K, the new superconductors rank first after the celebrated cuprates, and the latest announcements on ultrathin films promise even more. Thin film synthesis of these superconductors began in 2008 immediately after their discovery, and this growing research area has seen remarkable progress up to the present day, especially with regard to the iron chalcogenides FeSe and FeSe1-xTex, the iron pnictide BaFe2-xCoxAs2 and iron-oxyarsenides. This essential volume provides comprehensive, state-of-the-art coverage of iron-based superconducting thin films in topical chapters with detailed information on thin film synthesis and growth, analytical film characterization, interfaces, and various aspects on physics and materials properties. Current efforts towards technological applications and functional films are outlined and discussed. The development and latest results for monolayer FeSe films are also presented. This book serves as a key reference for students, lecturers, industry engineers, and academic researchers who would like to gain an overview of this complex and growing research area.

Studies of Thin-film Growth, Adsorption, and Oxidation by in Situ, Real-time, and Ex Situ Ion Beam Analysis

Studies of Thin-film Growth, Adsorption, and Oxidation by in Situ, Real-time, and Ex Situ Ion Beam Analysis
A Book

by Anonim

  • Publisher : Unknown Publisher
  • Release : 1993
  • Pages : 25
  • ISBN : 9876543210XXX
  • Language : En, Es, Fr & De
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We have developed a time-of-flight (TOF) ion scattering and direct recoil spectrometer (ISS/DRS) to study the surface composition and reconstruction of metals, metal-oxides, and semiconductors, and to provide in situ characterization of the thin-film deposition process. In situ, real-time study of Pb, Zr, and Ru ultrathin films produced by ion beam sputter deposition is presented as demonstration of pulsed ion beam surface analysis (PIBSA) as a means of characterizing monolayer and submonolayer growth, both in UHV and in mTorr oxygen background. The capability of performing surface analysis at pressures>10−3 Torr is unique to pulsed ion beam surface analysis among surface analytical methods and enables the in situ monitoring of oxide thin-film growth processes and surface-gas phase reactions. Using angular-resolved ISS (ARISS), combined with Auger electron spectroscopy (AES), we studied the oxygen adsorption and reconstruction of (001) oriented InSb thin-film surfaces. It was found that the adsorption of molecular oxygen on the InSb (001) surface is consistent with the Langmuir model. Oxygen adsorption preferentially occurs on the antimony sites corresponding to the extension of the lattice into the vacuum and reduces the inward contraction of the first two layers of the clean InSb (001) surface relative to the bulk atomic spacing.